: Since its initial development in the early 1970’s, spectroscopic ellipsometry (SE) has become the primary technique for determining optical properties of materials and structures, and one of the primary techniques for assessing and controlling deposition and processing either off-line or in real time. SE has evolved into spectroscopic polarimetry, which in turn evolved into Mueller-matrix polarimetry, a technique that can obtain information about materials that scatter as well as reflect light. The extension of wavelength ranges into the THz and vacuum-ultraviolet (vuv) spectral regions opened additional capabilities. In addition to its impact on technology, SE data provided the material from which our current knowledge of nanoscopically inhomogeneous materials, including plasmonics, has developed. I cover these and other developments, as well as current activities in the field.
Refreshments will be served at 2:30 P.M. in Olin Hall 118